EMS150T S高分辨率离子溅射仪

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产品价格： < 面议

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公司名称：海德创业（北京）生物科技有限公司

所在地：北京昌平

发布时间：2018-08-11

浏览次数：1428 次

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产品简介

型号：EMS150T  S
简介：
分子涡轮高真空系统，CPU程序全自动控制，触膜屏用户界面，可镀多种膜材，也可镀相对较厚的膜。具有快速溅射易氧化和不氧化金属（贵金属）靶材的功能，可选各种溅射靶材，包括常用于场发射电镜的铱和铬。

产品详细信息

型号：EMS150T S

简介：

分子涡轮高真空系统，CPU程序全自动控制，触膜屏用户界面，可镀多种膜材，也可镀相对较厚的膜。具有快速溅射易氧化和不氧化金属（贵金属）靶材的功能，可选各种溅射靶材，包括常用于场发射电镜的铱和铬。

可选配一系列可选附件，如：金属蒸镀、碳丝蒸镀、膜厚测量等。

标准配置的样品台，无倾角，高度不可调。如果需要倾斜样平台，需要另外选择。

主要技术指标:
尺寸和重量：仪器机箱：585mm宽x 470mm长 x 410mm高 (总高: 650mm)
仪器总重量：33.4Kg
工作腔室：硼硅酸盐玻璃，152mm（内） x 127mm高
触摸屏全图像用户界面
样品台：标配件（无倾角，高度不可调），转速8-20rpm
真空系统：

涡轮分子泵：带有空气冷却的涡轮分子泵（标准配置里面）

旋转机械泵：双级旋转机械泵（需要另购）

真空度： 5x10^-3-----5x10^-1 mbar
溅射时间：*长60分钟
溅射靶材：57mm Ø x 0.3mm Chromium（标准配置：铬靶材一个）

产品选购

货号	产品名称	规格
3380	EMS150T S - High resolution turbomolecular pumped sputter coater, including a 54mm Ø x 0.3mm chromium target	标准配置
91003	Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter	个

其它附件的选购:

货号	产品名称	规格
3200	Sputtering head insert suitable for oxidizing and non-oxidizing metals. Supplied with a 54mm x 0.3mm thick chromium target as standard. For additional targets see Sputtering Targets section	个
3210	Additional sputter insert for quick metal change. Note: this is an entire sputtering assembly.	个
3270	Extended height vacuum chamber (214mm high – the standard chamber is 127mm high). For increased source to sample distance and for coating large specimens	个
3280	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS150T when bench depth is limited	个
3290	Film thickness monitor (FTM) attachment. Consists of a built in chamber mounted quartz crystal oscillator (includes crystal). As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited	个
3300	Spare quartz crystals. Pack of three	个
3320	Full range vacuum gauge for low and high vacuum measurement (a low vacuum Pirani gauge is fitted as standard)	个
4513	Glow discharge insert to modify surface properties (eg hydrophobic to hydrophilic conversion) or to clean surface residues (TS and T ES only). Can be retrofitted	个
3340	Rotate-tilt specimen stage with adjustable tilt (up to 90 degrees) and height (37mm-60mm). Tilt angle can be pre-set. 50mm Ø specimen platform with six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm	个
3350	Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm	个
3360	Flat rotation specimen stage for 100mm / 4” wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm	个
3370	variable between 8 and 20rpm. Includes gear box to allow optional FTM to be used	个

靶材的选购（举例如下，实际提供的靶材规格材质更多）：

货号	产品名称	规格
3410	57mm Ø x 0.1mm,金靶	个
3411	57mm Ø x 0.1mm金/钯靶(80/20)	个
3412	57mm Ø x 0.1mm铂金靶	个
3413	57mm Ø x 0.1mm镍靶	个
3414	57mm Ø x 0.1mm银靶	个
3415	57mm Ø x 0.1mm钯靶	个
3416	57mm Ø x 0.1mm铜靶	个
3417	57mm Ø x 0.3mm铬靶	个
3418	57mm Ø x 0.5mm钨靶	个
3422	57mm Ø x 0.1mm铝靶	个